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Federated Electronic Theses and Dissertations
Texas Tech University
Fluid flow and concentration distribution in a radial flow plasma etch reactor
Fluid flow and concentration distribution in a radial flow plasma etch reactor
Date
1990-12
Authors
Singh, Vikram
Journal Title
Journal ISSN
Volume Title
Publisher
Texas Tech University
Abstract
Not available
Description
Keywords
Semiconductors -- Etching -- Mathematical models
,
Plasma etching -- Mathematical models
Citation
URI
http://hdl.handle.net/2346/14700
Collections
Texas Tech University
Full item page