Free radical graft polymerization lithography and modeling base quenchers in photoresists

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Title: Free radical graft polymerization lithography and modeling base quenchers in photoresists
Author: Michaelson, Timothy Bryan
Abstract: Not available
URI: http : / /hdl .handle .net /2152 /2000
Date: 2008-08-28

Citation

Free radical graft polymerization lithography and modeling base quenchers in photoresists. Doctoral dissertation, The University of Texas at Austin. Available electronically from http : / /hdl .handle .net /2152 /2000 .

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